Polarization fatigue mechanism of laminated hafnium zirconium oxide ferroelectric thin films-Reference-Cited by-同舟云学术

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Polarization fatigue mechanism of laminated hafnium zirconium oxide ferroelectric thin films

Published:2024-06 Issue: Volume:272 Page:119920
ISSN:1359-6454
Container-title:Acta Materialia
language:en
Short-container-title:Acta Materialia

Author:

Zeng Binjian,Xie Shichang,Zhang Sirui,Huang Haoliang,Ju Changfan,Zheng Shuaizhi,Peng Qiangxiang,Yang Qiong,Zhou Yichun,Liao Min

Funder

Science and Technology Program of Hunan Province

National Natural Science Foundation of China

Publisher

Elsevier BV

Reference44 articles.

1. The fundamentals and applications of ferroelectric HfO2;Schroeder;Nat. Rev. Mater.,2022

2. HfO2-based ferroelectric thin film and memory device applications in the post-Moore era: a review;Liao;Fundam. Res.,2023

3. HfO2-based ferroelectrics: from enhancing performance, material design, to applications;Chen;Appl. Phys. Rev.,2022

4. The high-k solution;Bohr;IEEE Spectr.,2007

5. Ferroelectricity in hafnium oxide thin films;Böscke;Appl. Phys. Lett.,2011

Cited by 3 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Structural characteristics and polarization switching behaviors in HfO2-ZrO2 ferroelectric nanolaminates;Journal of Alloys and Compounds;2024-11

2. Optimal Process Design for Wake-Up Free Hf0.5Zr0.5O2 Ferroelectric Capacitors: Toward Low-Power Devices with Enhanced Ferroelectric Performance;Electronics;2024-07-23

3. The contradiction between thermodynamic and kinetic effects of stress-modulated antiferroelectricity in ZrO₂ thin films;Materials Horizons;2024

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