Analysis of the formation of Ta2O5 passive films in acid media through mechanistic modeling-Reference-Cited by-同舟云学术

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Analysis of the formation of Ta2O5 passive films in acid media through mechanistic modeling

Published:2011-09 Issue:23 Volume:56 Page:8040-8047
ISSN:0013-4686
Container-title:Electrochimica Acta
language:en
Short-container-title:Electrochimica Acta

Author:

Cabrera-Sierra R.,Vazquez-Arenas J.,Cardoso S.,Luna-Sánchez R.M.,Trejo M.A.,Marín-Cruz J.,Hallen J.M.

Funder

Natural Sciences and Engineering Research Council of Canada

Consejo Nacional de Ciencia y Tecnología

Publisher

Elsevier BV

Subject

Electrochemistry,General Chemical Engineering

Reference30 articles.

1. Localized Corrosion of Aluminum: Blister Formation as a Precursor of Pitting

2. Precursive Blistering in the Localized Corrosion of Aluminum

3. Theory of Steady‐State Passive Films

4. Steady‐State Passive Films: Interfacial Kinetic Effects and Diagnostic Criteria

5. An electrochemical impedance analysis of passive films on nickel(111) in phosphate buffer solutions

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