In situ STM and EQCM studies of tantalum electrodeposition from TaF5 in the air- and water-stable ionic liquid 1-butyl-1-methylpyrrolidinium bis(trifluoromethylsulfonyl)amide-Reference-Cited by-同舟云学术

In situ STM and EQCM studies of tantalum electrodeposition from TaF5 in the air- and water-stable ionic liquid 1-butyl-1-methylpyrrolidinium bis(trifluoromethylsulfonyl)amide

Published:2009-02 Issue:5 Volume:54 Page:1519-1528
ISSN:0013-4686
Container-title:Electrochimica Acta
language:en
Short-container-title:Electrochimica Acta

Author:

Borisenko N.,Ispas A.,Zschippang E.,Liu Q.,Zein El Abedin S.,Bund A.,Endres F.

Publisher

Elsevier BV

Subject

Electrochemistry,General Chemical Engineering

Reference28 articles.

1. Tantalum—processing, properties and applications

2. Corrosion behavior of niobium, tantalum and their alloys in boiling sulfuric acid solutions

3. Corrosion behavior of niobium, tantalum and their alloys in hot hydrochloric and phosphoric acid solutions

4. Low-temperature chemical vapor deposition of tantalum nitride from tantalum pentabromide for integrated circuitry copper metallization applications

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