Electrodeposition of bismuth, tellurium and bismuth telluride through sub-10 nm mesoporous silica thin films-Reference-Cited by-同舟云学术

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Electrodeposition of bismuth, tellurium and bismuth telluride through sub-10 nm mesoporous silica thin films

Published:2024-11 Issue: Volume:505 Page:144989
ISSN:0013-4686
Container-title:Electrochimica Acta
language:en
Short-container-title:Electrochimica Acta

Author:

Shao Li^ORCID,Zhelev Nikolay^ORCID,Zhang Wenjian,Reid Gillian^ORCID,Huang Ruomeng^ORCID,Bartlett Philip N.^ORCID,Hector Andrew L.^ORCID

Funder

EPSRC

Publisher

Elsevier BV

Reference49 articles.

1. Bismuth nanowire arrays: synthesis and galvanomagnetic properties;Heremans;Phys. Rev. B,2000

2. Electronic transport properties of single-crystal bismuth nanowire arrays;Zhang;Phys. Rev. B,2000

3. On-film formation of Bi nanowires with extraordinary electron mobility;Shim;Nano Lett.,2009

4. Two-dimensional tellurium: progress, challenges, and prospects;Shi;Nano-Micro Lett.,2020

5. Elemental tellurium as a chiral $p$-type thermoelectric material;Peng;Phys. Rev. B,2014

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