AFM lithography for fabrication of magnetic nanostructures and devices-Reference-Cited by-同舟云学术

AFM lithography for fabrication of magnetic nanostructures and devices

Published:2006-09 Issue:1 Volume:304 Page:19-22
ISSN:0304-8853
Container-title:Journal of Magnetism and Magnetic Materials
language:en
Short-container-title:Journal of Magnetism and Magnetic Materials

Author:

Takemura Yasushi,Shirakashi Jun-ichi

Publisher

Elsevier BV

Subject

Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Reference12 articles.

1. Modification of hydrogen‐passivated silicon by a scanning tunneling microscope operating in air

2. NiFe-Based Nanostructures Fabricated Using an Atomic Force Microscope

3. Applied voltage dependence of nano-oxidation of ferromagnetic thin films using atomic force microscope

4. Faradaic current detection during anodic oxidation of the H-passivated p-Si(001) surface with controlled relative humidity

5. N. Funakoshi, G. Watanabe, T. Yamada, Y. Takemura, J. Shirakashi, in: Proceedings of the 13th International Conference on Scanning Tunneling Microscopy/Spectroscopy and Related Techniques (STM’05), Sapporo, Japan, 2005.

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