New polishing method using water-based slurry under AC electric field for glass substrate

Author:

Kusumi Takayuki,Sato Yasuhiro,Akagami Yoichi,Umehara Noritsugu

Publisher

Elsevier BV

Subject

Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Reference5 articles.

1. In-situ observation of behaviour of abrasives in magnetic fluid grinding;Umehara;Journal of Magnetism and Magnetic Materials,1995

2. Monodisperse particles and ferrofluids: a fruit-fly model system;Skjeltorp;Journal of Magnetism and Magnetic Materials,1983

3. Interaction forces between nonmagnetic particles in the magnetized magnetic fluid;Fujita;Journal of Magnetism and Magnetic Materials,1987

4. ER fluid finishing using rotating electrode;Akagami;Journal of Intelligent Material Systems and Structures,1999

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1. Center-injected Polishing for Efficient Slurry Utilization;International Journal of Precision Engineering and Manufacturing-Green Technology;2024-04-02

2. Surface Creation Using Free Abrasives Controlled by AC Electric Field;Journal of the Japan Society for Precision Engineering;2023-05-05

3. 電界砥粒制御技術による表面創成技術;Journal of The Surface Finishing Society of Japan;2022-11-01

4. Polymer/CeO2–Fe3O4 multicomponent core–shell particles for high-efficiency magnetic-field-assisted polishing processes;International Journal of Machine Tools and Manufacture;2016-02

5. Effects of humidity and counter-surface on tribochemical wear of soda-lime-silica glass;Wear;2015-11

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