Magnetic and structural characterization of Ni(1−x)Gex thin film-Reference-Cited by-同舟云学术

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Magnetic and structural characterization of Ni(1−x)Gex thin film

Published:2015-01 Issue: Volume:373 Page:164-168
ISSN:0304-8853
Container-title:Journal of Magnetism and Magnetic Materials
language:en
Short-container-title:Journal of Magnetism and Magnetic Materials

Author:

Kazan S.,Kocaman B.,Parabaş A.,Yıldız F.,Aktaş B.

Funder

DPT (State Planning Organization of Turkey)

Publisher

Elsevier BV

Subject

Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Reference22 articles.

1. Nickel-based contact metallization for SiGe MOSFETs: progress and challenges

2. 40 Gb/s surface-illuminated Ge-on-Si photodetectors

3. Self-diffusion and interdiffusion in intermetallic compounds

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1. Structural, surface morphological and dielectric studies of FeGe alloys grown using electron beam deposition;Ferroelectrics;2023-01-02

2. Collective spin behavior of NiGe thin films on MgO substrate;Journal of Magnetism and Magnetic Materials;2021-06

3. Investigation of Magnetic Anisotropy in the Ni-Ge and Ni(NiO)-Ge Thin Films;Journal of Molecular Structure;2021-04

4. Effective Schottky barrier lowering of NiGe/p-Ge(100) using Terbium interlayer structure for high performance p-type MOSFETs;Scientific Reports;2020-03-04

5. Kinetics of interface alloy phase formation at nanometer length scale in ultra-thin films: X-ray and polarized neutron reflectometry;Progress in Materials Science;2018-07

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