Multi-target sputter deposition of Ni50Ti50−xHfx shape memory thin films for high temperature microactuator application-Reference-Cited by-同舟云学术

Multi-target sputter deposition of Ni50Ti50−xHfx shape memory thin films for high temperature microactuator application

Published:2005-06 Issue:2 Volume:121 Page:543-548
ISSN:0924-4247
Container-title:Sensors and Actuators A: Physical
language:en
Short-container-title:Sensors and Actuators A: Physical

Author:

Sanjabi S.,Cao Y.Z.,Barber Z.H.

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Metals and Alloys,Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation,Electronic, Optical and Magnetic Materials

Reference16 articles.

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2. Sputter deposition of high transition temperature Ni–Ti–Hf alloy thin films;Johnson;J. Phys. IV,1995

3. Thin film shape-memory materials for high-temperature applications;Grummon;JOM,2003

4. Shape memory and transformation behavior of martensitic Ti–Pd–Ni and Ti–Pt–Ni alloys;Lindquist,1990

5. Investigation of transformation temperatures, microstructure and shape memory properties of NiTi, NiTiZr and NiTiHf alloys;Olier;J. Phys. IV,1995

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