Simulation tool for proximity effects in high aspect ratio UV-lithographic patterning-Reference-Cited by-同舟云学术

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Simulation tool for proximity effects in high aspect ratio UV-lithographic patterning

Published:2008-03 Issue:1 Volume:142 Page:429-433
ISSN:0924-4247
Container-title:Sensors and Actuators A: Physical
language:en
Short-container-title:Sensors and Actuators A: Physical

Author:

Triltsch U.,Feldmann M.,Boese C.,Büttgenbach S.

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Metals and Alloys,Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation,Electronic, Optical and Magnetic Materials

Reference10 articles.

1. Application of thick film resists in MEMS;Büttgenbach;Nano-optics Microsyst.,2005

2. A novel reluctance actuator employing an embedded ferro magnetic foil;Waldschik;Harmst,2005

3. Technology and application of electrodepositable photo resists to create uniform coatings needed for complex 3D micro-actuators and sensors;Feldmann;Harmst,2005

4. Fast Optical and Process Proximity Correction Algorithms for Integrated Circuit Manufacturing;Cobb,1998

5. Optical Proximity Correction (OPC)—friendly maze routing;Huang,2004

Cited by 3 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Modular Computer Aided Design Environment for Active Microsystems;Design and Manufacturing of Active Microsystems;2011

2. Investigation of Antiadhesive Coatings for Nanoimprinting Lithography;Materials and Manufacturing Processes;2010-07-23

3. Design and Implementation of New Sensors and Their Integration in Joints;Springer Tracts in Advanced Robotics;2010

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