Author:
Cheng Di,Gosálvez Miguel A.,Hori Tatsuya,Sato Kazuo,Shikida Mitsuhiro
Subject
Electrical and Electronic Engineering,Metals and Alloys,Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation,Electronic, Optical and Magnetic Materials
Reference10 articles.
1. Anisotropic etching of surfactant-added TMAH solution;Sekimura,1999
2. Change in orientation-dependent etching properties of single-crystal silicon caused by a surfactant added to TMAH solution;Sato;Sens. Mater.,2001
3. The effect of alcohol additives on etching characteristics in KOH solutions;Zubel;Sens. Actuators A,2002
4. Anisotropic etching of {100} and {110} planes in (100) silicon;Powell;J. Micromech. Microeng.,2001
5. Change in etching properties of single crystal silicon caused by the difference of surfactants added to TMAH solutions;Cheng,2004
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