Molecular dynamics simulation of CH3 interaction with Si(100) surface
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics
Reference20 articles.
1. Role of hydrogen ions in plasma‐enhanced chemical vapor deposition of hydrocarbon films, investigated by in situ ellipsometry
2. Elementary processes in plasma–surface interaction: H-atom and ion-induced chemisorption of methyl on hydrocarbon film surfaces
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Cited by 4 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Collision reactions of CH radical on diamond and their effects on the carbon film growth;Acta Physica Sinica;2016
2. Molecular dynamics simulation of hydrogenated carbon film growth from CH radicals;Applied Surface Science;2012-12
3. Film growth by polyatomic C2H5+ bombarding a diamond (100) surfaces: Molecular dynamics study;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2009-09
4. The application of molecular dynamics to the study of plasma–surface interactions: CFxwith silicon;International Reviews in Physical Chemistry;2008-04
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