Behaviour of a low temperature argon plasma at atmospheric pressure seeded with some metallic aerosols under thermodynamic non-equilibrium conditions
Author:
Publisher
Elsevier BV
Subject
Spectroscopy,Instrumentation,Atomic and Molecular Physics, and Optics,Analytical Chemistry
Reference47 articles.
1. Some considerations on the excitation mechanism in the inductively coupled argon plasma
2. A theoretical study and experimental investigation of non-LTE phenomena in an inductively-coupled argon plasma—I. Characterization of the discharge
3. Analyte ionization in the inductively coupled plasma
4. Excitation mechanisms and discharge characteristics-recent developments;Blades,1987
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1. Nucleation and aerosol processing in atmospheric pressure electrical discharges: powders production, coatings and filtration;Journal of Physics D: Applied Physics;2006-01-06
2. Magnesium as a representative analyte metal in argon inductively coupled plasmas. II. Population mechanisms in analytical zones of different spectrochemical systems;Spectrochimica Acta Part B: Atomic Spectroscopy;1997-05
3. Magnesium as a representative analyte metal in argon inductively coupled plasmas. I. An extensive collisional-radiative model;Spectrochimica Acta Part B: Atomic Spectroscopy;1997-05
4. An Equation for Calculating the Spatial Distribution ofthe Background Intensity in Argon Inductively Coupled Plasma.;Analytical Sciences;1996
5. Collisional-radiative modelling of quasi-thermal air plasmas with electronic temperatures between 2000 and 13,000 K—II. 2000 K⩽Θe⩽4000 K;Journal of Quantitative Spectroscopy and Radiative Transfer;1995-02
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