Analysis of electronic grade chlorine by sealed inductively coupled plasma atomic emission spectroscopy
Author:
Publisher
Elsevier BV
Subject
Spectroscopy,Instrumentation,Atomic and Molecular Physics, and Optics,Analytical Chemistry
Reference29 articles.
1. Etching and film formation in CF3Br plasmas: some qualitative observations and their general implications
2. Plasma etching in integrated circuit manufacture—A review
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1. Enclosed Inductively Coupled Plasma: Spatially Resolved Profiles of Rotational Temperatures and Analyte Atom Distribution;Applied Spectroscopy;2001-11
2. Electron temperature and radiative attachment continua in enclosed inductively coupled plasma in argon and chlorine;Spectrochimica Acta Part B: Atomic Spectroscopy;1997-12
3. Atomic emission of anhydrous hydrogen bromide: Spectra from 200 to 900 nm by sealed inductively coupled plasma-atomic emission spectroscopy;Spectrochimica Acta Part B: Atomic Spectroscopy;1997-12
4. Investigation of iron determination in HCl gas using the nondispersive atomic fluorescence spectrometer with a tantalum coil atomizer;Spectrochimica Acta Part B: Atomic Spectroscopy;1997-07
5. Direct determination of metal traces in process gases by atomic absorption spectrometry using automated analyte trapping;Spectrochimica Acta Part B: Atomic Spectroscopy;1997-07
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