The application of low-frequency glow discharge to high-rate deposition of a-Si:H-Reference-Cited by-同舟云学术

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The application of low-frequency glow discharge to high-rate deposition of a-Si:H

Published:1998-05 Issue: Volume:227-230 Page:39-42
ISSN:0022-3093
Container-title:Journal of Non-Crystalline Solids
language:en
Short-container-title:Journal of Non-Crystalline Solids

Author:

Budaguan Boris G,A. Popov Alexander,Sazonov Andrei Yu,Bosyakov Mikhail N,Grunsky Dmitriy I,Zhuk Dmitriy W

Publisher

Elsevier BV

Subject

Materials Chemistry,Condensed Matter Physics,Ceramics and Composites,Electronic, Optical and Magnetic Materials

Reference15 articles.

1. W.E. Spear, P.G. LeComber, in: J.D. Joannopoulos, G. Lucovsky (Eds.), The Physics of Hydrogenated Amorphous Silicon I, Springer, Berlin, 1984, p. 63.

2. Very High Frequency Glow Discharge: Plasma- and Deposition Aspects

3. Diagnostics of High-Rate a-Si:H Deposition in a Variable Frequency Plasma

4. Yu.P. Raizer, Fizika gazovogo razryada, Nauka, Moscow, 1987.

5. Yu.P. Raizer, Gas Discharge Physics, Springer, Berlin, 1991.

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