Boron diffusion from a spin-on source during rapid thermal processing
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Condensed Matter Physics,Ceramics and Composites,Electronic, Optical and Magnetic Materials
Reference12 articles.
1. Formation of silicided, ultra-shallow junctions using low thermal budget processing
2. Rapid thermal process-induced recombination centers in ion implanted silicon
3. Material and electrical properties of ultra-shallow p/sup +/-n junctions formed by low-energy ion implantation and rapid thermal annealing
4. C. Park, K.M. Klein, Al.F. Tasch, R.B. Simonton, G.E. Lux, IEDM 91 Tech. Dig. (1991) 67
5. Challenges to manufacturing submicron, ultra-large scale integrated circuits
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