A new, laminar flow photo-CVD method for preparing hydrogenated amorphous silicon films-Reference-Cited by-同舟云学术

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A new, laminar flow photo-CVD method for preparing hydrogenated amorphous silicon films

Published:1991-01 Issue: Volume:137-138 Page:665-668
ISSN:0022-3093
Container-title:Journal of Non-Crystalline Solids
language:en
Short-container-title:Journal of Non-Crystalline Solids

Author:

Furukawa Akihiko,Iida Yoshinori,Yamaguchi Tetsuya,Harada Nozomu,Nozaki Hidetoshi,Kamimura Takaaki,Yano Kensaku,Ito Hiroshi,Okumura Katsuya

Publisher

Elsevier BV

Subject

Materials Chemistry,Condensed Matter Physics,Ceramics and Composites,Electronic, Optical and Magnetic Materials

Reference6 articles.

1. X-Ray Fluorescence Analysis of Hg in SiO2Films Deposited by Hg-Sensitized Photo-CVD

2. Characteristics for a-Si:H Films Prepared by Mercury-Sensitized Photochemical Vapor Deposition

3. ‘Clean’ a-Si:H prepared in a UHV system

4. High performance a-Si solar cells and new fabrication methods for a-Si solar cells

5. Correlation between Si-H2Bond Density and Electron Drift Mobility in a-Si:H Films Prepared by Photochemical Vapor Deposition

Cited by 4 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Light-annealing effect on a-Si:H photodiode with the Ar laser-irradiation;Journal of Non-Crystalline Solids;2002-02

2. Light-soaking effects on a-Si:H photodiodes deposited by the laminar-flow photo-CVD method;IEEE Transactions on Electron Devices;2001

3. Characteristics of a-Si:H films prepared by a novel laminar flow photo-chemical vapor deposition method;Journal of Non-Crystalline Solids;1996-05

4. The bias-annealing effect on a-Si:H photodiode;Journal of Non-Crystalline Solids;1996-05

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