Effects of atomic hydrogen injection on ECR plasma deposition of a-Ge:H
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Condensed Matter Physics,Ceramics and Composites,Electronic, Optical and Magnetic Materials
Reference10 articles.
1. Guiding Principle in the Preparation of High-Photosensitive Hydrogenated Amorphous Si-Ge Alloys from Glow-Discharge Plasma
2. DC Bias Effects on Growth of a-Ge:H in Coaxial-Type ECR Plasma
3. Hydrogen dilution effects on properties of ECR plasma deposited a-Ge:H
4. Guiding principle for preparing highly photosensitive Si-based amorphous alloys
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1. Absence of photodegradation in amorphous chalcogenide films with a narrow optical bandgap;Philosophical Magazine Letters;1997-09
2. Photodegradation in high-quality hydrogenated amorphous germanium;Philosophical Magazine Letters;1997-03
3. Photoinduced effects and metastability in amorphous semiconductors and insulators;Advances in Physics;1995-12
4. Large volume electron cyclotron resonance plasma generation by use of the slotted antenna microwave source;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;1995-05
5. A Basic Study of the GeH4 + H2 RF Discharge;MRS Proceedings;1994
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