1. Davis, J.I., Wakalopulos, G., 1996. Chemistry considerations for low-voltage EB applications. in: Proceedings of the Radtech’96, North America, p. 317
2. Fluoropolymers;Dole,1973
3. Plasma etching and modification of organic polymers;Egitto;Pure Appl. Chem.,1990
4. Hamamatsu Photonics K.K., 〈http://jp.hamamatsu.com/products/light-source/3001/index_ja.html〉.
5. Hirayama, H., Namito, Y., Bielajew, A.F., Wilderman, S.J., Nelson, W.R., 2005a. The EGS5 Code System. SLAC-R-730