Preferential sputtering in binary targets-Reference-Cited by-同舟云学术

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Preferential sputtering in binary targets

Published:1995-06 Issue:2 Volume:49 Page:155-196
ISSN:0079-6816
Container-title:Progress in Surface Science
language:en
Short-container-title:Progress in Surface Science

Author:

Zaporozchenko Vladimir I.,Stepanova Maria G.

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry

Reference95 articles.

1. Sputtering by Particle Bombardment II,1983

2. Materials Modification by High Fluence Ion Beam;Kelly,1989

3. Compositional depth profiling by sputtering

4. Ion beam modification of metals: Compositional and microstructural changes

Cited by 32 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Ripple pattern formation on silicon carbide surfaces by low-energy ion-beam erosion;Journal of Physics: Conference Series;2023-01-01

2. Sputtering;Low-Energy Ion Irradiation of Materials;2022

3. Ripple patterns over oblique Ar+ sputtered SiC/Si(1 1 1) surfaces: Role of preferential sputtering;Materials Letters;2022-01

4. New collective trampoline mechanism of accelerated ion-plasma sputtering;Journal of Physics D: Applied Physics;2019-02-25

5. Recent developments in ion beam-induced nanostructures on AIII-BV compound semiconductors;Journal of Physics: Condensed Matter;2018-07-05

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