Stability of cavities formed by He+ implantation in silicon
Author:
Publisher
Elsevier BV
Subject
Instrumentation,Nuclear and High Energy Physics
Reference19 articles.
1. Gettering of metals by voids in silicon
2. Gettering of metals by He induced voids in silicon
3. Silicon‐on‐insulator produced by helium implantation and thermal oxidation
4. Deuterium interactions in oxygen‐implanted copper
5. Chemical and electrical properties of cavities in silicon and germanium
Cited by 27 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Microstructure Evolution in He-Implanted Si at 600 °C Followed by 1000 °C Annealing;Materials;2021-09-06
2. Dynamic behavior of helium bubbles at high temperature in Si studied by in situ TEM, STEM-EELS, and TDS;Journal of Applied Physics;2019-10-07
3. Transmission electron microscopy and high-resolution electron microscopy studies of structural defects induced in Si single crystals implanted by helium ions at 600 °C;Applied Surface Science;2018-10
4. Evolution of the properties of helium nanobubbles during in situ annealing probed by spectrum imaging in the transmission electron microscope;Physical Review B;2018-03-07
5. Growth and migration of nanocavities in He+ multi-implanted Si measured by in situ small-angle X-ray scattering;Materials Science and Engineering: B;2014-03
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3