Sequential ion implantation of copper and cobalt in silica glass: A study by synchrotron radiation techniques-Reference-Cited by-同舟云学术

Sequential ion implantation of copper and cobalt in silica glass: A study by synchrotron radiation techniques

Published:2002-05 Issue:1-4 Volume:191 Page:406-410
ISSN:0168-583X
Container-title:Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
language:en
Short-container-title:Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms

Author:

Cattaruzza E.,D'Acapito F.,de Julian Fernandez C.,de Lorenzi A.,Gonella F.,Mattei G.,Maurizio C.,Mazzoldi P.,Padovani S.,Scremin B.F.,Zontone F.

Publisher

Elsevier BV

Subject

Instrumentation,Nuclear and High Energy Physics

Reference15 articles.

Cited by 14 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

4. Magnetic properties of Co, Ni, Pt and their alloy nanoparticles formed in SiO2 by ion beam synthesis;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2012-02

5. Structure and thermal stability of Au–Fe alloy nanoclusters formed by sequential ion implantation in silica;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2006-09