Influences of H ion implantation on Ti:O,H,D films prepared by rf sputtering-Reference-Cited by-同舟云学术

Influences of H ion implantation on Ti:O,H,D films prepared by rf sputtering

Published:2000-06 Issue:1-4 Volume:169 Page:156-160
ISSN:0168-583X
Container-title:Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
language:en
Short-container-title:Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms

Author:

Nakao Setsuo,Miyagawa Soji,Miyagawa Yoshiko,Jin Ping,Mizota Takeshi,Niwa Hiroaki,Saitoh Kazuo

Publisher

Elsevier BV

Subject

Instrumentation,Nuclear and High Energy Physics

Reference10 articles.

1. Phase transformations in titanium hydrides

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3. S. Nakao, K. Saitoh, T. Hirahara, M. Ikeyama, M. Tazawa, P. Jin, H. Niwa, S. Tanemura, Y. Miyagawa, S. Miyagawa, K. Yasuda, Thin Solid Films 343–344 (1999) 195

4. K. Saitoh, S. Nakao, H. Matsuda, H. Niwa, Y. Saitoh, Y. Nakajima, S. Tajima, H. Naramoto, TIARA Annual Report, 1997, 1998, p. 190

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