Multi-layered nanocavities in silicon with sequential helium implantation/anneal
Author:
Publisher
Elsevier BV
Subject
Instrumentation,Nuclear and High Energy Physics
Reference11 articles.
1. The density and pressure of helium in bubbles in implanted metals: A critical review
2. Helium desorption/permeation from bubbles in silicon: A novel method of void production
3. Hydrogen interactions with cavities in helium-implanted silicon
4. Relative free energies of Si surfaces
5. Electrical properties of He-implantation-produced nanocavities in silicon
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1. Dose accumulation and 3D imaging with He+ ions;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2015-01
2. Effects of surface oxide layer on nanocavity formation and silver gettering in hydrogen ion implanted silicon;Journal of Applied Physics;2013-07-14
3. Annealing of hydrogen-induced defects in RF-plasma-treated Si wafers:ex situandin situtransmission electron microscopy studies;Journal of Physics D: Applied Physics;2011-06-30
4. Annealing ambient on the evolution of He-induced voids in silicon;Applied Surface Science;2011-06
5. Laser treatment of plasma-hydrogenated silicon wafers for thin layer exfoliation;Journal of Applied Physics;2011-03-15
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