Trench homogeneity in plasma immersion ion implantation
Author:
Publisher
Elsevier BV
Subject
Instrumentation,Nuclear and High Energy Physics
Reference12 articles.
1. Plasma source ion‐implantation technique for surface modification of materials
2. Comparison of measured and calculated dose for plasma source ion implantation into 3-D objects
3. Lateral implantation homogeneity of wedge-shaped samples treated by plasma immersion ion implantation
4. Child-Langmuir sheath structure around wedge-shaped cathodes
5. Ion focusing by an expanding, two‐dimensional plasma sheath
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1. Numerical simulation of plasma immersion ion implantation for cubic target with finite length using three-dimensional particle-in-cell model;Acta Physica Sinica;2011
2. Incident ion fluence gradients on the front and backside of flat samples;Surface and Coatings Technology;2007-04
3. The distribution and depth of ion doses implanted into wedges by plasma immersion ion implantation in drifting and stationary plasmas;Plasma Sources Science and Technology;2006-04-27
4. Two-dimensional texture and sheath evolution in metal plasma immersion ion implantation;Surface and Coatings Technology;2005-10
5. Two dimensional computer simulation of plasma immersion ion implantation;Brazilian Journal of Physics;2004-12
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