Photoreactive molecular layers containing aryl ester units: Preparation, UV patterning and post-exposure modification-Reference-Cited by-同舟云学术

Photoreactive molecular layers containing aryl ester units: Preparation, UV patterning and post-exposure modification

Published:2010-01 Issue:1-2 Volume:119 Page:287-293
ISSN:0254-0584
Container-title:Materials Chemistry and Physics
language:en
Short-container-title:Materials Chemistry and Physics

Author:

Höfler Thomas,Track Anna M.,Pacher Peter,Shen Quan,Flesch Heinz-Georg,Hlawacek Gregor,Koller Georg,Ramsey Michael G.,Schennach Robert,Resel Roland,Teichert Christian,Kern Wolfgang,Trimmel Gregor,Griesser Thomas

Publisher

Elsevier BV

Subject

Condensed Matter Physics,General Materials Science

Reference46 articles.

1. Structure and growth of self-assembling monolayers

2. Formation and Structure of Self-Assembled Monolayers

3. Functionalization of self-assembled monolayers on glass and oxidized silicon wafers by surface reactions

4. Corrosion Passivation of Gold by n-Alkanethiol Self-Assembled Monolayers: Effect of Chain Length and End Group

5. Characterization of Self-Assembled Monolayers Formed from Sodium S-Alkyl Thiosulfates on Copper

Cited by 11 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Synthesis of Fluorescent Au Nanocrystals–Silica Hybrid Nanocomposite (FLASH) with Enhanced Optical Features for Bioimaging and Photodynamic Activity;Langmuir;2017-12-15

2. Photo-Fries rearrangement of 1-pyrenyl esters;Tetrahedron Letters;2017-11

3. Plasmon-Induced Photoreaction of o-Nitrobenzyl-Based Ligands under 550 nm Light;The Journal of Physical Chemistry C;2017-06-12

4. Photo-Fries Reaction and Related Processes;Arene Chemistry;2015-11-27

5. Ex situ and in situ characterization of patterned photoreactive thin organic surface layers using friction force microscopy;Scanning;2014-09-02