Effect of sputtering power on the physical properties of dc magnetron sputtered copper oxide thin films-Reference-Cited by-同舟云学术

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Effect of sputtering power on the physical properties of dc magnetron sputtered copper oxide thin films

Published:2008-08 Issue:2-3 Volume:110 Page:397-401
ISSN:0254-0584
Container-title:Materials Chemistry and Physics
language:en
Short-container-title:Materials Chemistry and Physics

Author:

Reddy A. Sivasankar,Park Hyung-Ho,Reddy V. Sahadeva,Reddy K.V.S.,Sarma N.S.,Kaleemulla S.,Uthanna S.,Reddy P. Sreedhara

Publisher

Elsevier BV

Subject

Condensed Matter Physics,General Materials Science

Reference30 articles.

1. High-Efficiency Oxide Heterojunction Solar Cells Using Cu2O Sheets

2. Electrical and optical properties of TCO–Cu2O heterojunction devices

3. Polycrystalline n ‐ZnO/ p ‐Cu 2 O heterojunctions grown by RF‐magnetron sputtering

4. Effect of hydrogen plasma treatment on the electrical properties of sputtered N-doped cuprous oxide films

5. Electrochromism in copper oxide thin films

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3. Oxygen partial pressure dependent sputtered copper oxide films for visible photodetectors;Surfaces and Interfaces;2023-10

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5. Optical monitoring of DC/RF plasma sputtering for copper oxide film growth at low temperature;Surfaces and Interfaces;2023-08

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