Characteristics of SiOx-containing hard film prepared by low temperature plasma enhanced chemical vapor deposition using hexamethyldisilazane or vinyltrimethylsilane and post oxygen plasma treatment-Reference-Cited by-同舟云学术

Characteristics of SiOx-containing hard film prepared by low temperature plasma enhanced chemical vapor deposition using hexamethyldisilazane or vinyltrimethylsilane and post oxygen plasma treatment

Published:2017-03 Issue: Volume:189 Page:183-190
ISSN:0254-0584
Container-title:Materials Chemistry and Physics
language:en
Short-container-title:Materials Chemistry and Physics

Author:

Wei Yi-Syuan,Liu Wan-Yu,Wu Hsin-Ming,Chen Ko-Shao,Cech Vladimir

Funder

Ministry of Science and Technology

Publisher

Elsevier BV

Subject

Condensed Matter Physics,General Materials Science

Reference29 articles.

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4. High quality plasma enhanced chemical vapour deposited silicon oxide gas barrier coatings on polyester films;Howells;Thin Solid Films,2008

5. Properties of SiO2-like barrier layers on polyethersulfone substrates by low-temperature plasma-enhanced chemical vapor deposition;Wuu;Thin Solid Films,2004

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