Structural, morphological, and chemical composition of ternary ZrHfN thin films deposited by reactive co-magnetron sputtering

Author:

Phae-ngam Wuttichai,Gitgeatpong GanateeORCID,Prathumsit Jedsada,Horprathum MatiORCID,Lertvanithphol Tossaporn,Triamnak Narit,Nakajima HidekiORCID

Funder

National Electronics and Computer Technology Center

Phranakhon Rajabhat University

Publisher

Elsevier BV

Reference71 articles.

1. Transition Metal Carbides and Nitrides;Toth,1971

2. Influence of nitrogen flow rates on the structure, hardness, and electrical resistivity of HfN coatings by dc sputtering;García-González;J. Mater. Eng. Perform.,2015

3. The hardest superconducting metal nitride;Wang;Sci. Rep.,2015

4. Chapter 3 – the Evolution of Nitride Semiconductors;Kamiyama,2005

5. Discovery of earth-abundant nitride semiconductors by computational screening and high-pressure synthesis;Hinuma;Nat. Commun.,2016

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