Ni-Cr-Mn-Y-Nb resistive thin film prepared by co-sputtering

Author:

Chen Wei-Ju,Liu Tung-Yueh,Lee Ho-Yun,Lee Ying-Chieh

Funder

Ministry of Science and Technology

Publisher

Elsevier BV

Subject

Condensed Matter Physics,General Materials Science

Reference34 articles.

1. TCR control of Ni-Cr resistive film deposited by DC magnetron sputtering;Chuang;Vacuum,2015

2. Proc. Of the 1984 International Symp. On Microelectronics;Bhatt,1984

3. Super precision metal film resistors;Matsuda;Natl. Tech. Rep.,1980

4. Influence of deposition and processing parameters on the TCR of Ni-Cr-Cu-Al alloy film resistors;Isler;IEEE Trans. Parts, Mater. Packag. PMP,1969

5. Modifications test of vacuum deposition Ni/Cr films with Mn and Si for thin film resistors;Schippel;Crystal,1980

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