On the way to increase osseointegration potential: Sequential SI-ATRP as promising tool for PEEK-based implant nano-engineering-Reference-Cited by-同舟云学术

On the way to increase osseointegration potential: Sequential SI-ATRP as promising tool for PEEK-based implant nano-engineering

Published:2024-04 Issue: Volume:210 Page:112953
ISSN:0014-3057
Container-title:European Polymer Journal
language:en
Short-container-title:European Polymer Journal

Author:

Ślusarczyk Kinga^ORCID,Flejszar Monika^ORCID,Spilarewicz Kaja^ORCID,Wytrwal Magdalena^ORCID,Awsiuk Kamil^ORCID,Wolski Karol^ORCID,Raczkowska Joanna^ORCID,Janiszewska Natalia^ORCID,Chmielarz Paweł^ORCID

Publisher

Elsevier BV

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