Formation process and mechanism of iron-nitride compounds on Si(1 1 1)-7 × 7-CH3OH surface-Reference-Cited by-同舟云学术

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Formation process and mechanism of iron-nitride compounds on Si(1 1 1)-7 × 7-CH3OH surface

Published:2018-07 Issue: Volume:703 Page:17-22
ISSN:0009-2614
Container-title:Chemical Physics Letters
language:en
Short-container-title:Chemical Physics Letters

Author:

Li Wenxin,Ding Wanyu,Ju Dongying,Tanaka Ken-ichi,Komori Fumio

Funder

Nano Project of Saitama Institute of Technology in Japan

National Natural Science Foundation of China

Natural Science Foundation of Liaoning Province, China

Publisher

Elsevier BV

Subject

Physical and Theoretical Chemistry,General Physics and Astronomy

Reference30 articles.

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2. Picosecond laser micromachining prior to FIB milling for electronic microscopy sample preparation;Sikora;Appl. Surf. Sci.,2017

3. Leakage current mechanism of InN-based metal-insulator-semiconductor structures with Al2O3 as dielectric layers;Wang;Nanoscale Res. Lett.,2016

4. Supernormal conversion anode consisting of high-density MoS2 bubbles wrapped in thin carbon network by self-sulfuration of polyoxometalate complex;Wang;ACS Nano,2017

5. A self-powered thin film radiation detector using intrinsic high energy current;Zygmanski;Med. Phys.,2016

Cited by 3 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Exploring the Dual Characteristics of CH3OH Adsorption to Metal Atomic Structures on Si (111)-7 × 7 Surface;Molecules;2021-09-26

2. Growth of Fe Islands on Clean and Ammonia-saturated Si(111)7 × 7 Surfaces Studied by in situ Electron Diffraction;Journal of the Physical Society of Japan;2021-03-15

3. Metal Deposition Induced by the Step Region of Si (111)-(7 × 7) Surface;Coatings;2021-02-27

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