Ag films deposited on Si and Ti: How the film-substrate interaction influences the nanoscale film morphology-Reference-Cited by-同舟云学术

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Ag films deposited on Si and Ti: How the film-substrate interaction influences the nanoscale film morphology

Published:2017-11 Issue: Volume:111 Page:81-89
ISSN:0749-6036
Container-title:Superlattices and Microstructures
language:en
Short-container-title:Superlattices and Microstructures

Author:

Ruffino F.,Torrisi V.

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Condensed Matter Physics,General Materials Science

Reference48 articles.

1. Physics of Thin Films-research and Development;Hass,1982

2. The Physical Properties of Thin Metal Films;Zhigal’skii,2003

3. Metallic Films for Electronic, Optical and Magnetic Applications-structure, Processing and Properties;Barmak,2014

4. Engineering atomic and molecular nanostructures at surfaces

5. Nanostructured Columnar Thin Films Using Oblique Angle Deposition: Growth, SERS Characterization and Litographic Processing;Shah,2012

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2. Physico-Chemical Properties and In Vitro Antifungal Evaluation of Samarium Doped Hydroxyapatite Coatings;Coatings;2020-08-27

3. LaF3 electrolyte-insulator-semiconductor sensor for detecting fluoride ions;Sensors and Actuators B: Chemical;2019-01

4. Morphological Characteristics of Au Films Deposited on Ti: A Combined SEM-AFM Study;Coatings;2018-03-26

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