Influence of film thickness and annealing temperature on the structural and optical properties of ZnO thin films on Si (100) substrates grown by atomic layer deposition-Reference-Cited by-同舟云学术

Influence of film thickness and annealing temperature on the structural and optical properties of ZnO thin films on Si (100) substrates grown by atomic layer deposition

Published:2015-07 Issue: Volume:83 Page:719-729
ISSN:0749-6036
Container-title:Superlattices and Microstructures
language:en
Short-container-title:Superlattices and Microstructures

Author:

Tian Ji-Li,Zhang Hua-Yu,Wang Gui-Gen,Wang Xin-Zhong,Sun Rui,Jin Lei,Han Jie-Cai

Funder

National Natural Science Foundation of China

Natural Science Foundation of Guangdong Province

Weapon & Equipment Pre-research Foundation of General Armament Department

Shenzhen Science and Technology Plan Supported Project

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Condensed Matter Physics,General Materials Science

Reference27 articles.

1. Quantum confinement in ZnO nanorods

2. Effects of post-annealing treatment on the light emission properties of ZnO thin films on Si

3. Influence of film thickness on the properties of sprayed ZnO thin films for gas sensor applications

4. Enhancement of light extraction in GaN-based light-emitting diodes by Al2O3-coated ZnO nanorod arrays

5. ZnO based visible–blind UV photodetector by spray pyrolysis

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