Formation of Ge-nanocrystals in SiO2 matrix by magnetron sputtering and post-deposition thermal treatment-Reference-Cited by-同舟云学术

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Formation of Ge-nanocrystals in SiO2 matrix by magnetron sputtering and post-deposition thermal treatment

Published:2008-10 Issue:4-5 Volume:44 Page:323-330
ISSN:0749-6036
Container-title:Superlattices and Microstructures
language:en
Short-container-title:Superlattices and Microstructures

Author:

Desnica U.V.,Salamon K.,Buljan M.,Dubcek P.,Radic N.,Desnica-Frankovic I.D.,Siketic Z.,Bogdanovic-Radovic I.,Ivanda M.,Bernstorff S.

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Condensed Matter Physics,General Materials Science

Reference14 articles.

1. Semiconductor Clusters, Nanocrystals, and Quantum Dots

2. Small Clusters Hit the Big Time

3. Group-IV nanocluster formation by ion-beam synthesis

4. Ion synthesis and laser annealing of Cu nanoparticles in Al 2 O 3

5. A Novel Approach of Fabricating Germanium Nanocrystals for Nonvolatile Memory Application

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1. The amazing world of self-organized Ge quantum dots for Si photonics on SiN platforms;Applied Physics A;2023-01-17

2. Rapid thermal annealing induced formation of Ge nanoparticles in ZnO thin films: A detailed SAXS study;Materials Science in Semiconductor Processing;2015-06

3. Structure and effects of annealing in colloidal matrix-free Ge quantum dots;Journal of Synchrotron Radiation;2015-01-01

4. Ellipsometric study of thermally induced redistribution and crystallization of Ge in Ge:SiO2 mixture layers;Thin Solid Films;2011-06

5. Growth and characterization of nc-Ge prepared by microwave annealing;Vacuum;2011-03

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