Heavy-ion beam test of a monolithic silicon pixel sensor with a new 130 nm High-Resistivity CMOS process-Reference-Cited by-同舟云学术

Heavy-ion beam test of a monolithic silicon pixel sensor with a new 130 nm High-Resistivity CMOS process

Published:2022-09 Issue: Volume:1039 Page:167049
ISSN:0168-9002
Container-title:Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment
language:en
Short-container-title:Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment

Author:

Yang Haibo,Mai Fatai^ORCID,Liao Jianwei,Zhang Honglin,Ma Xiaomeng,Gao Chaosong,Ren Weiping,Zhou Wei,Sun Xiangming,Liu Jun,Li Xianqin,Niu Xiaoyang,Chen Xurong,Zhao Chengxin^ORCID

Publisher

Elsevier BV

Subject

Instrumentation,Nuclear and High Energy Physics

Reference13 articles.

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