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Formation of repetitively pulsed high-intensity, low-energy silicon ion beams

  • Published:2020-02 Issue: Volume:953 Page:163092
  • ISSN:0168-9002
  • Container-title:Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment
  • language:en
  • Short-container-title:Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment

Author:

Ryabchikov Alexander I.,Sivin Denis O.,Dektyarev Sergey V.,Shevelev Alexey E.

Funder

Ministry of Education and Science of the Russian Federation

Publisher

Elsevier BV

Subject

Instrumentation,Nuclear and High Energy Physics

Reference40 articles.

1. Surface Modification and Alloying by Laser, Ion, and Electron Beams [Proceedings of a NATO Advanced Study Institute];Poate,1983

2. Ion Implantation and Beam Processing [Academic];Williams,1984

3. Handbook of Deposition Technologies for Films and Coatings: Science, Applications and Technology;Martin,2009

4. Microstructure of the near-surface layers of ion-implanted polycrystalline Cu;Kozlov;Surf. Coat. Technol.,1992

5. Thin-film adhesion;Chapman;J. Vacuum Sci. Technol.,1974

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