Atomic Layer Deposition (ALD) grown thin films for ultra-fine pitch pixel detectors-Reference-Cited by-同舟云学术

Atomic Layer Deposition (ALD) grown thin films for ultra-fine pitch pixel detectors

Published:2016-09 Issue: Volume:831 Page:2-6
ISSN:0168-9002
Container-title:Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment
language:en
Short-container-title:Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment

Author:

Härkönen J.,Ott J.,Mäkelä M.,Arsenovich T.,Gädda A.,Peltola T.,Tuovinen E.,Luukka P.,Tuominen E.,Junkes A.,Niinistö J.,Ritala M.

Publisher

Elsevier BV

Subject

Instrumentation,Nuclear and High Energy Physics

Reference20 articles.

1. RD50 Status Report, Radiation Hard Semiconductor Devices for Very High Luminosity Colliders, CERN-LHCC-2005-037 and LHCC-RD-009, 2005.

2. CMS collaboration, CMS Technical Design Report for the Pixel Detector Upgrade, CMS-TDR-11, 〈http://cds.cern.ch/record/1481838〉, 2012.

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4. AC-coupled n-in-p pixel detectors on MCz silicon with atomic layer deposition (ALD) grown thin film;Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment;2021-01