Author:
Juntunen Mikko,Ji Fan,Henttinen Kimmo,Luusua Ismo,Hietanen Iiro,Eränen Simo
Subject
Instrumentation,Nuclear and High Energy Physics
Reference3 articles.
1. F. Ji, S. Leppävuori, I. Luusua, K. Henttinen, S. Eränen, I. Hietanen, M. Juntunen, Fabrication of silicon based through-wafer interconnects for advanced chip scale packaging, to be published in: Eurosensors XX 2006 Conference Proceedings, vol. 1, Gothenburg, Sweden, 2006, pp. 188–189.
2. Process compatible polysilicon-based electrical through-wafer interconnects in silicon substrates
3. I. Luusua, K. Henttinen, P. Pekko, T. Vehmas, H. Luoto, Through-Wafer Polysilicon Interconnect Fabrication with In-Situ Boron Doping; in: Symposium Journal of MRS Spring Meeting Proceedings, vol. 872, spring 2005, p. J5.5.
Cited by
2 articles.
订阅此论文施引文献
订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献