Coupled simulation of gas flow and heat transfer in an RTP-system with rotating wafer-Reference-Cited by-同舟云学术

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Coupled simulation of gas flow and heat transfer in an RTP-system with rotating wafer

Published:1998-12 Issue:3-4 Volume:1 Page:201-205
ISSN:1369-8001
Container-title:Materials Science in Semiconductor Processing
language:en
Short-container-title:Materials Science in Semiconductor Processing

Author:

Poscher S.,Theiler T.

Publisher

Elsevier BV

Subject

Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science

Reference5 articles.

1. Spalding B, editor. The Phoenics journal of computational fluid dynamic and its applications, vol. 8, No. 4. Wimbledon, December 1995

2. Electronic Materials Informations Service: EMIS data-reviews series. Properties of silicon. London: Inspec, 1988

3. Ludwig JC. Phoenics-2 instruction course notes. CHAM TR300. Wimbledon, 1994

4. Zhi-min Ling. Silicon oxidation: modeling, characterization and strategic considerations. Ph.D. thesis, Leuven, 1989. p. 181

5. The national technology road-map for semiconductors. 1997 ed. Austin: SEMATECH, 1997. p. 190

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1. TiN barriers for high-k capacitors: simulations and experimental results;Microelectronic Engineering;2001-05

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