Rapid thermal annealing applied to the optimization of titanium oxide arc-Reference-Cited by-同舟云学术

Rapid thermal annealing applied to the optimization of titanium oxide arc

Published:1998-12 Issue:3-4 Volume:1 Page:331-334
ISSN:1369-8001
Container-title:Materials Science in Semiconductor Processing
language:en
Short-container-title:Materials Science in Semiconductor Processing

Author:

Lemiti M.,Boyeaux J.P.,El Omari H.,Kaminski A.,Laugier A.

Publisher

Elsevier BV

Subject

Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science

Reference14 articles.

1. Schindler R, Reis I, Wagner B, Eyer A, Lautenschlager H, Schetter C, Warta W, Hartiti B, Slaoui A, Muller JC, Siffert P. 23rd IEEE Photovoltaic Specialist Conf. Record. 1993. p. 162

2. Hartiti B, Slaoui A, Muller JC, Siffert P, Schindler R, Reis I, Wagner B, Eyer A. 23rd IEEE Photovoltaic Specialist Conf. Record. 1993. p. 224

3. El Omari H, Boyeaux JP, Laugier A. 1st World Conf. on Photovoltaic Energy Conversion. 24th IEEE Photovoltaic Specialist Conf. Record. 1994. p. 1539

4. Electron diffusion length in rapid thermal processedp‐type silicon

5. Boyeaux JP, Masri K, Chaussemy G, Mayet L, Laugier A. 21st IEEE Photovoltaic Specialist Conf. Record. 1990. p. 629

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