Tracing the Ti-silicide formation by in situ ellipsometric measurements
Author:
Publisher
Elsevier BV
Subject
Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science
Reference18 articles.
1. Lepselter MP, Andrews JM. In: Schwartz B, editor. Ohmic contacts to semiconductors, The Electrochemical Society, London, 1969. p. 159.
2. Infrared photoemission of holes from ultrathin (3?20 nm) Pt/Ir-compound silicide films into silicon
3. Local identification and mapping of the C49 and C54 titanium phases in submicron structures by micro-Raman spectroscopy
4. Comparison of transformation to low-resistivity phase and agglomeration of TiSi/sub 2/ and CoSi/sub 2/
5. Deriving the kinetic parameters for Pt-silicide formation from temperature ramped in situ ellipsometric measurements
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