High-temperature stability of PECVD-derived organosilica membranes deposited on TiO2 and SiO2–ZrO2 intermediate layers using HMDSO/Ar plasma-Reference-Cited by-同舟云学术

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High-temperature stability of PECVD-derived organosilica membranes deposited on TiO2 and SiO2–ZrO2 intermediate layers using HMDSO/Ar plasma

Published:2014-01 Issue: Volume:121 Page:13-19
ISSN:1383-5866
Container-title:Separation and Purification Technology
language:en
Short-container-title:Separation and Purification Technology

Author:

Nagasawa Hiroki,Minamizawa Toshihiro,Kanezashi Masakoto,Yoshioka Tomohisa,Tsuru Toshinori

Funder

Core Research for Evolutionary Science and Technology (CREST), Japan Science and Technology Agency (JST)

Publisher

Elsevier BV

Subject

Filtration and Separation,Analytical Chemistry

Reference35 articles.

1. Improvement of hardness in plasma polymerized hexamethyldisiloxane coatings by silica-like surface modification;Benitez;Thin Solid Films,2000

2. Intermediate gas phase precursors during plasma CVD of HMDSO;Theirich;Vacuum,2003

3. Deposition rate and three-dimensional uniformity of RF plasma deposited SiOx films;Hegemann;Surf. Coat. Technol.,2001

4. Gas separation properties of organosilicon plasma polymerized membranes;Roualdes;AIChE J.,1999

5. Gas permeation of PECVD membranes inside alumina substrate tubes;Pages;Sep. Purif. Technol.,2001

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