In situ interface oxidation-adsorption by ferrate (VI)/PMS self-excitation: Unique dual-reaction platform for phenylarsonic acid degradation and immobilization-Reference-Cited by-同舟云学术

In situ interface oxidation-adsorption by ferrate (VI)/PMS self-excitation: Unique dual-reaction platform for phenylarsonic acid degradation and immobilization

Published:2023-11 Issue: Volume:325 Page:124651
ISSN:1383-5866
Container-title:Separation and Purification Technology
language:en
Short-container-title:Separation and Purification Technology

Author:

Yang Ze^ORCID,Guo Songding,Huan Zhenglai^ORCID,Zhu Yongbing,Zhang Tingting^ORCID,Li Shangyi^ORCID

Funder

National Key Research and Development Program of China

Fundamental Research Funds for the Central Universities

Publisher

Elsevier BV

Subject

Filtration and Separation,Analytical Chemistry

Reference68 articles.

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3. Extraction and detection of organoarsenic feed additives and common arsenic species in environmental matrices by HPLC–ICP-MS;Liu;Microchem. J.,2013

4. Mechanism, kinetics, and pathways of self-sensitized sunlight photodegradation of phenylarsonic compounds;Xie;Water Res.,2016

5. Birnessite (δ-MnO2) mediated degradation of organoarsenic feed additive p-arsanilic acid;Wang;Environ. Sci. Technol.,2015

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