Silicon wafer surface patterning using femtosecond laser irradiation below ablation threshold

Author:

Dalili Alireza,Tan Bo,Venkatakrishnan Krishnan

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Mechanical Engineering,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference23 articles.

1. Böhme R, Zimmer K, Rauschenbach B. Direct laser etching of transparent materials: High-quality surface patterning and figuring for micro-optical applications. In: Proceedings of SPIE—The International Society for Optical Engineering. vol 6254, Chernivtsi, Ukraine, 2005. p. 1–9.

2. Laser-based microscale patterning of biodegradable polymers;Chen;International Journal of Materials and Product Technology,2003

3. Sub-micron surface patterning by laser irradiation through microlens arrays;Lim;Journal of Materials Processing Technology,2007

4. Formation of ring patterns surrounded by ripples by single-shot laser irradiation with ultrashort pulse width at the solid/liquid interface;Katayama;Applied Physics Letters,2003

5. Femtosecond laser ablation of silicon modification thresholds and morphology;Bonse;Applied Physics A: Materials Science and Processing,2002

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