Fabrication of continuous relief micro-optic elements using real-time maskless lithography technique based on DMD-Reference-Cited by-同舟云学术

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Fabrication of continuous relief micro-optic elements using real-time maskless lithography technique based on DMD

Published:2014-03 Issue: Volume:56 Page:367-371
ISSN:0030-3992
Container-title:Optics & Laser Technology
language:en
Short-container-title:Optics & Laser Technology

Author:

Zhong Kejun,Gao Yiqing,Li Feng,Luo Ningning,Zhang Weiwei

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference18 articles.

1. Binary optics: A VLSI-based microoptics technology;Margaret;Microelectronic Engineering,1996

2. Fabrication of continuous-relief micro-optical elements by direct laser writing in photoresists;Gale;Optical Engineering,1994

3. Direct laser writing of relief diffraction gratings into a bulk chalcogenide glass;Kohoutek;Journal of the Optical Society of America B,2012

4. 3D microoptical elements formed in a photostructurable germanium silicate by direct laser writing;Malinauskas;Optical and Lasers Engineering,2012

5. Multi-step electron beam technology for the fabrication of high performance diffractive optical elements;Kowalik;Microelectronic Engineering,2005

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