Photoelasticity-based stress field analysis of glass under 1064 nm laser irradiation-Reference-Cited by-同舟云学术

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Photoelasticity-based stress field analysis of glass under 1064 nm laser irradiation

Published:2024-10 Issue: Volume:181 Page:108367
ISSN:0143-8166
Container-title:Optics and Lasers in Engineering
language:en
Short-container-title:Optics and Lasers in Engineering

Author:

Zhao Nan^ORCID,Zhang Hongchao,Lu Jian,Tang Mao,Zhang Hailong^ORCID

Publisher

Elsevier BV

Reference35 articles.

1. Diamond scribing and laser breaking for lcd glass substrates;Chwan-Huei;J Mater Process Technol,2008

2. Pulsed laser breaking technique for glass substrates;Tsai,2009

3. Residual stress. Part 1–measurement techniques;Withers;Mater Sci Technol,2001

4. Interdependence of elastic strain and segregation in metallic multilayers: an x-ray diffraction study of (111) au/ni multilayers;Labat;J Appl Phys,2000

5. Residual stress depth profiling in complex hard coating systems by x-ray diffraction;Klaus;Thin Solid Films,2008

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