Investigation on properties of TiO2 thin films deposited at different oxygen pressures-Reference-Cited by-同舟云学术

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Investigation on properties of TiO2 thin films deposited at different oxygen pressures

Published:2008-04 Issue:3 Volume:40 Page:550-554
ISSN:0030-3992
Container-title:Optics & Laser Technology
language:en
Short-container-title:Optics & Laser Technology

Author:

Shen Yanming,Yu Hua,Yao Jianke,Shao Shuying,Fan Zhengxiu,He Hongbo,Shao Jianda

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference26 articles.

1. Deposition of TiO2 thin films by plasma-enhanced decomposition of tetraisopropyltitanate;Frenck;Thin Solid Films,1991

2. Investigations of TiO2 films deposited by different techniques;Bange;Thin Solid Films,1991

3. Effects of solvent on properties of sol–gel-derived TiO2 coating films;Hu;Thin Solid Films,1992

4. Titanium dioxide photocatalysts produced by reactive magnetron sputtering;Weinberger;Appl Phys Lett,1995

5. Morphology and structure of TiO2 thin layers vs thickness and substrate temperature;Lottiaux;Thin Solid Films,1989

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