Effect of spray coated SiO2 layers on the low temperature oxidation of Si3N4

Author:

Lee Sea-Hoon,Rixecker Georg,Aldinger Fritz,Choi Sung-Churl,Auh Keun-Ho

Publisher

Elsevier BV

Subject

Materials Chemistry,Ceramics and Composites

Reference23 articles.

1. The low temperature oxidation problem in yittria-densified silicon nitride ceramics;Patel;Br. Ceram. Trans. J.,1988

2. In-situ observation of the oxidation behavior of a silicon nitride densified with the aid of Y2O3 and Al2O3 by hot-stage microscopy;Costa Oliviera;Key Eng. Mater.,1996

3. Jack, K. H., The relationship of phase diagrams to research and development of Sialon. In Phase Diagrams, Vol. 5, ed. A. M. Alper. Academic Press, 1978, pp. 241–285.

4. Oxidation of silicon nitride sintered with rare-earth oxide additions;Mieskowski;J. Am. Ceram. Soc.,1985

5. Effect of high-temperature exposure in air on strength of hot-pressed silicon nitride;Ritter;J. Am. Ceram. Soc.,1983

Cited by 7 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Preparation, oxidation property and mechanism of Si3N4/O′-SiAlON composite ceramics;Ceramics International;2021-06

2. Analysis of Electronic Properties of Silicon Nitride Based on Materials Studio;Proceedings of the International Symposium on Big Data and Artificial Intelligence;2018-12-29

3. Effect of surface nano-modification on the antioxidation properties of Si3N4 ceramics;Journal of Alloys and Compounds;2018-10

4. Fabrication of Si3N4-based seal coating on porous Si3N4 ceramics;International Journal of Materials and Product Technology;2011

5. Microstructural characterization of the oxide scale on nitride bonded SiC-ceramics;Ceramics International;2008-01

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号  京ICP备18003416号-3