Effect of oxygen partial pressure on the NTCR characteristics of sputtered NixMn3−xO4+δ thin films-Reference-Cited by-同舟云学术

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Effect of oxygen partial pressure on the NTCR characteristics of sputtered NixMn3−xO4+δ thin films

Published:2004-01 Issue:6 Volume:24 Page:1247-1250
ISSN:0955-2219
Container-title:Journal of the European Ceramic Society
language:en
Short-container-title:Journal of the European Ceramic Society

Author:

Basu A.,Brinkman A.W.,Schmidt R.

Publisher

Elsevier BV

Subject

Materials Chemistry,Ceramics and Composites

Reference7 articles.

1. Preparation and performance of thick film NTC thermistors;Schmidt;Key Engineering Materials,2002

2. Structure and Properties of Ceramics. Materials Science Monographs 80,1994

3. Thermistors;Macklen,1979

4. Hopping conduction in III-V compounds;Mansfield,1991

5. Electronic properties of doped semiconductors. Solid State Sciences 45;Shklovskii,1984

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1. Electrical and aging properties of Mn2-xNi0.7Cu0.3ZnxO4 NTC ceramic thermistors for low-resistance applications;Journal of Materials Science: Materials in Electronics;2022-09-27

2. Influence of crystallization temperature and atmosphere on the phase composition, microstructure and electrical properties of Ni–Mn–O thin films;Open Ceramics;2021-06

3. Electrical properties of Nb/Al-doped CuO-based ceramics for NTC thermistors;Processing and Application of Ceramics;2020

4. Li/Fe modified Zn0.3Ni0.7O NTC thermistors with adjustable resistivities and temperature sensitivity;Journal of Materials Science: Materials in Electronics;2017-10-13

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