Detection of high mass cluster ions sputtered from Bi surfaces-Reference-Cited by-同舟云学术

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Detection of high mass cluster ions sputtered from Bi surfaces

Published:1976-12 Issue:2 Volume:44 Page:371-373
ISSN:0009-2614
Container-title:Chemical Physics Letters
language:en
Short-container-title:Chemical Physics Letters

Author:

Shepard A.,Hewitt R.W.,Slusser G.J.,Baitinger W.E.,Cooks R.G.,Winograd N.,Delgass W.N.,Varon A.,Devant G.

Publisher

Elsevier BV

Subject

Physical and Theoretical Chemistry,General Physics and Astronomy

Reference6 articles.

1. Developments in secondary ion mass spectroscopy and applications to surface studies

2. Studies of adsorption and surface reactivity of metals by secondary ion mass spectrometry II. Adsorption of ethylene on nickel

3. Adsorption and surface reactivity of metals by secondary ion mass spectrometry. Part 1.—Adsorption of carbon monoxide on nickel and copper

4. A. Shepard, W.E. Baitinger, W.N. Delgass, R.G. Cooks and N. Winograd, to be published.

5. Clusters sputtered from tungsten

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1. Collisions of organic ions at surfaces;Applied Surface Science;2004-06

2. Formation, stability, and structures of antimony oxide cluster ions;The Journal of Chemical Physics;1999-01-15

3. Antimony and Bismuth Oxide Clusters: Growth and Decomposition of New Magic Number Clusters;The Journal of Physical Chemistry A;1997-08-01

4. On the phenomenon of direct emission of small Si+n( n = 2, 3) clusters from an Ar+-bombarded Si surface;Surface Science;1995-01

5. On the mechanism of small Sin+andAln+ (n = 1–3) cluster emission from 3–10 keV Ar+ bombarded Al and Si surfaces at increased target current densities;Surface Science;1994-01

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